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Thermal oxidation information


Furnaces used for diffusion and thermal oxidation at LAAS technological facility in Toulouse, France.

In microfabrication, thermal oxidation is a way to produce a thin layer of oxide (usually silicon dioxide) on the surface of a wafer. The technique forces an oxidizing agent to diffuse into the wafer at high temperature and react with it. The rate of oxide growth is often predicted by the Deal–Grove model.[1] Thermal oxidation may be applied to different materials, but most commonly involves the oxidation of silicon substrates to produce silicon dioxide.

  1. ^ Liu, M.; et al. (2016). "Two-dimensional modeling of the self-limiting oxidation in silicon and tungsten nanowires". Theoretical and Applied Mechanics Letters. 6 (5): 195–199. arXiv:1911.08908. doi:10.1016/j.taml.2016.08.002.

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Thermal oxidation

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In microfabrication, thermal oxidation is a way to produce a thin layer of oxide (usually silicon dioxide) on the surface of a wafer. The technique forces...

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Polymer degradation

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cannot be fully excluded and thermal-oxidation will usually take place more readily than degradation that is exclusively thermal (i.e. without air). Reactions...

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Thermal oxidizer

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with the hazardous gases. The simplest technology of thermal oxidation is direct-fired thermal oxidizer. A process stream with hazardous gases is introduced...

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Thermal degradation of polymers

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oxidation. Autoxidation Photo-oxidation of polymers Weather testing of polymers Environmental stress cracking Pielichowski, Krzysztof (2005). Thermal...

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Rapid thermal processing

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including dopant activation, thermal oxidation, metal reflow and chemical vapor deposition. One of the key challenges in rapid thermal processing is accurate...

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Thermogravimetric analysis

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chemical phenomena including chemisorptions, thermal decomposition, and solid-gas reactions (e.g., oxidation or reduction). Thermogravimetric analysis (TGA)...

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Silicon nanowire

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thermoelectrics and sensors. Initial synthesis of SiNWs is often accompanied by thermal oxidation steps to yield structures of accurately tailored size and morphology...

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LOCOS

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silicon surface. This cannot be easily achieved by etching field oxide. Thermal oxidation of selected regions surrounding transistors is used instead. The...

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Tungsten

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thermal oxidation step to control morphology in terms of length and aspect ratio. Using the Deal–Grove model it is possible to predict the oxidation kinetics...

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CMOS

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Wanlass, the fabrication of CMOS devices was outlined, on the basis of thermal oxidation of a silicon substrate to yield a layer of silicon dioxide located...

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Corrosion

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oxide layer glazes, prevent or reduce wear during high-temperature sliding contact of metallic (or metallic and ceramic) surfaces. Thermal oxidation is...

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Thermal Oxide Reprocessing Plant

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The Thermal Oxide Reprocessing Plant, or THORP, is a nuclear fuel reprocessing plant at Sellafield in Cumbria, England. THORP is owned by the Nuclear...

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Semiconductor device fabrication

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photolithographic and physio-chemical process (with steps such as thermal oxidation, thin-film deposition, ion-implantation, etching) during which electronic...

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Planar process

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semiconductor devices. The process utilizes the surface passivation and thermal oxidation methods. The planar process was developed at Fairchild Semiconductor...

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Environmental remediation

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attenuation, bioremediation-phytoremediation, chemical oxidation, steam-enhanced extraction and in situ thermal desorption and have been used extensively in the...

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Semiconductor

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process is called thermal oxidation, which forms silicon dioxide on the surface of the silicon. This is used as a gate insulator and field oxide. Other processes...

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MOSFET

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insulating layers are made thinner, often through steps of thermal oxidation or localised oxidation of silicon (LOCOS). For nano-scaled devices, at some point...

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Silicon dioxide

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passivation by thermal oxidation (silicon dioxide) is critical to the semiconductor industry. It is commonly used to manufacture metal–oxide–semiconductor...

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Chemical vapor deposition

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CVD oxide invariably has lower quality than thermal oxide, but thermal oxidation can only be used in the earliest stages of IC manufacturing. Oxide may...

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Thermal barrier coating

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temperatures while limiting the thermal exposure of structural components, extending part life by reducing oxidation and thermal fatigue. In conjunction with...

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Partial oxidation

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A distinction is made between thermal partial oxidation (TPOX) and catalytic partial oxidation (CPOX). Partial oxidation is a technically mature process...

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Thermal desorption

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The cooled offgas may be treated by carbon adsorption, or thermal oxidation. Thermal oxidation can be accomplished using a catalytic oxidizer, an afterburner...

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Polycarbonate

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photo-aging process. The reaction can be propagated via side chain oxidation, ring oxidation or photo-Fries rearrangement. Products formed include phenyl salicylate...

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Gate oxide

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source and drain when the transistor is turned on. Gate oxide is formed by thermal oxidation of the silicon of the channel to form a thin (5 - 200 nm)...

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Silicon

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layers of silicon oxide, an insulator that is easily produced on Si surfaces by processes of thermal oxidation or local oxidation (LOCOS), which involve...

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Autoxidation

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Autoxidation (sometimes auto-oxidation) refers to oxidations brought about by reactions with oxygen at normal temperatures, without the intervention of...

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