A photomaskA schematic illustration of a photomask (top) and an IC layer printed using it (bottom)
A photomask (also simply called a mask) is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are commonly used in photolithography for the production of integrated circuits (ICs or "chips") to produce a pattern on a thin wafer of material (usually silicon). In semiconductor manufacturing, a mask is sometimes called a reticle.[1][2]
In photolithography, several masks are used in turn, each one reproducing a layer of the completed design, and together known as a mask set. A curvilinear photomask has patterns with curves, which is a departure from conventional photomasks which only have patterns that are completely vertical or horizontal, known as manhattan geometry. These photomasks require special equipment to manufacture.[3]
A photomask (also simply called a mask) is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are...
the substrate. A photomask that contains the desired pattern is then placed over the photoresist. Light is shone through the photomask, exposing the photoresist...
photolithography whereby the image to be printed is obtained by illumination of a photomask in direct contact with a substrate coated with an imaging photoresist...
Photronics, Inc. is an American semiconductor photomask manufacturer. It was the third largest photomask supplier globally as of 2020. The company was...
ionic state transitions.), to produce a pattern by using a reflective photomask to expose a substrate covered by photoresist. In the 1960s, visible light...
Maskless lithography (MPL) is a photomask-less photolithography-like technology used to project or focal-spot write the image pattern onto a chemical...
microtechnology, mask inspection or photomask inspection is an operation of checking the correctness of the fabricated photomasks, used, e.g., for semiconductor...
is a binary file format used for specification of data structures for photomask production. It's used to represent a pattern an interchange and encapsulation...
Kabushiki-gaisha) is a Japanese company manufacturing optical products such as photomasks, photomask blanks and hard disk drive platters, contact lenses and eyeglass...
the hardware. A photomask having the intended grating features may also be used in the manufacture of fiber Bragg gratings. The photomask is placed between...
inspection, and others) Initially PCBs were designed manually by creating a photomask on a clear mylar sheet, usually at two or four times the true size. Starting...
copying by photographing each layer of an integrated circuit and preparing photomasks for its production on the basis of the photographs obtained is a reason...
polygons from an integrated circuit layout into set of instructions that a photomask writer can use to generate a physical mask. Typically, amendments and...
computer aided design. This is necessary for the layers to be defined for photomask production. The resolution of the circuits increases rapidly with each...
may or may not offer design services to third parties, as well as mask (photomask) making, semiconductor packaging and testing services, which can also...
systems that analyze and repair defects on photomasks and measure and optimize defined mask properties. The photomask contains all the structure information...
cover which can be applied to a photomask used in semiconductor device fabrication. The pellicle protects the photomask from damage and dirt Pellicle (cooking)...
perform non-repetitive and non-sequential tasks such as transporting photomasks in a semiconductor lab, specimens in hospitals and goods in warehouses...
Mask data preparation or MDP - The generation of actual lithography photomasks, utilised to physically manufacture the chip. Chip finishing which includes...
approach to photomask design. This is basically an approach to solve an inverse imaging problem: to calculate the shapes of the openings in a photomask ("source")...
Instruments was founded in 1975 by Ken Levy and Bob Anderson, and focused on photomask detection to identify chip defects. KLA later broadened its product line...
application of ruthenium is as the capping layer for extreme ultraviolet photomasks. Ruthenium is generally found in ores with the other platinum group metals...
Global Information
