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Toshiba CMOS information


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Toshiba CMOS

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This is a list of Toshiba's phone CMOS sensors. Sony Exmor Sony HAD CCD "T4K04". Toshiba. Retrieved 11 May 2015. "T4K05". Toshiba. Retrieved 11 May 2015...

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CMOS

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industry. Toshiba developed C2MOS (Clocked CMOS), a circuit technology with lower power consumption and faster operating speed than ordinary CMOS, in 1969...

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HCMOS

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compatible CMOS replacements to reduce power consumption without loss of speed. HCU stands for high-speed CMOS un-buffered. This type of CMOS contains no...

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ISOCELL

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image processor HAD CCD – Sony Expeed – Nikon image/video processors Toshiba CMOS OmniVision "Samsung ISOCELL Image Sensor Official Website | Samsung"...

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22 nm process

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The "22 nm" node is the process step following 32 nm in CMOS MOSFET semiconductor device fabrication. The typical half-pitch (i.e., half the distance between...

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Exmor

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their CMOS image sensors. It performs on-chip analog/digital signal conversion and two-step noise reduction in parallel on each column of the CMOS sensor...

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Die shrink

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Sony and Toshiba (from 180 nm CMOS in 2000 to 90 nm CMOS in 2003), the codenamed Cedar Mill Pentium 4 processors (from 90 nm CMOS to 65 nm CMOS) and Penryn...

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Nokia N75

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diagonal 1,36", 262,144 colors, 128x160 pixels Camera 2.0 mpx (Sensor: Toshiba CMOS, F/3, 5 mm), Flash: LED, 20x digital zoom, Exif Video recording Video:...

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R2000 microprocessor

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market the R2000. Sierra and Toshiba continued to serve as foundries. LSI fabricated the chip set in its 2.0 μm double-metal CMOS process and marketed it as...

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180 nm process

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engineer Bijan Davari fabricated a 180 nm dual-gate MOSFET using a CMOS process. The 180 nm CMOS process was later commercialized by TSMC in 1998, and then Fujitsu...

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Transistor count

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as two major NVM types: flash memory and read-only memory (ROM). Typical CMOS SRAM consists of six transistors per cell. For DRAM, 1T1C, which means one...

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90 nm process

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commercialized by the 2003–2005 timeframe, by semiconductor companies including Toshiba, Sony, Samsung, IBM, Intel, Fujitsu, TSMC, Elpida, AMD, Infineon, Texas...

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Flash memory

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devices. In 2016, Micron and Intel introduced a technology known as CMOS Under the Array/CMOS Under Array (CUA), Core over Periphery (COP), Periphery Under...

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Fingerprint scanner

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a visual image of the fingerprint using a digital camera. Capacitive or CMOS scanners use capacitors and thus electric current to form an image of the...

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65 nm process

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The 65 nm process is an advanced lithographic node used in volume CMOS (MOSFET) semiconductor fabrication. Printed linewidths (i.e. transistor gate lengths)...

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List of semiconductor scale examples

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1103, an early dynamic random-access memory (DRAM) chip launched in 1970. Toshiba TLCS-12, a microprocessor developed for the Ford EEC (Electronic Engine...

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Nokia N76

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diagonal 1,36", 262 144 colours, 128x160 pixels Camera 2.0 mpx (Sensor: Toshiba CMOS, F/3, 5 mm), Flash: LED, 20x digital zoom, Exif Video recording Video:...

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History of laptops

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applications. The Magnum could suspend and retain memory in battery-backed CMOS RAM, including a RAM Disk (D:). A separate expansion box provided dual 5...

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Aptina

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Aptina Imaging Corporation was a company that sold CMOS imaging products. Their CMOS sensors were used in the Nikon V1 (10.1 MP, CX format, 16.9x17.9 mm)...

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Zilog Z80

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Toshiba made a CMOS-version, the TMPZ84C00, which is believed[by whom?] (but not verified) to be the same design also used by Zilog for its own CMOS Z84C00...

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List of semiconductor fabrication plants

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2015-10-20. "Toshiba : Press Releases 13 April, 2004". Toshiba.co.jp. "Toshiba : Press Releases 04 September, 2007". Toshiba.co.jp. "Toshiba : Press Releases...

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Nikon D5200

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CMOS image sensor first announced by Nikon on November 6, 2012 for most of the world and January 7, 2013 for the North American market. The Toshiba TOS-5105...

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