Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
Infobox references
Chemical compound
NiSi
Identifiers
CAS Number
12035-57-3
3D model (JSmol)
Interactive image
ChemSpider
8351596
PubChem CID
10176091
InChI
InChI=1S/Ni.Si
Key: PEUPIGGLJVUNEU-UHFFFAOYSA-N
SMILES
[Si].[Ni]
Properties
Chemical formula
NiSi
Molar mass
86.778 g/mol
Structure[3]
Crystal structure
Orthorphomic, oP8
Space group
Pnma, No. 62
Lattice constant
a = 0.519 nm, b = 0.333 nm, c = 0.5628 nm
Formula units (Z)
4
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
Infobox references
Chemical compound
NiSi2
Identifiers
CAS Number
12201-89-7
3D model (JSmol)
Interactive image
PubChem CID
138395195
CompTox Dashboard (EPA)
DTXSID401014290
InChI
InChI=1S/Ni.2Si
Key: MGTLYUZSHHQPEY-UHFFFAOYSA-N
SMILES
[Ni].[Si].[Si]
Properties
Chemical formula
NiSi2
Molar mass
114.864 g/mol[1]
Density
7.83 g/cm3[1]
Melting point
993 °C (1,819 °F; 1,266 K)[1]
Structure[4]
Crystal structure
Cubic, cF12
Space group
Fm3m, No. 225
Lattice constant
a = 0.5406 nm
Formula units (Z)
4
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
Infobox references
Chemical compound
Nickel silicides include several intermetallic compounds of nickel and silicon. Nickel silicides are important in microelectronics as they form at junctions of nickel and silicon. Additionally thin layers of nickel silicides may have application in imparting surface resistance to nickel alloys.
^ abcdefHaynes, William M., ed. (2011). CRC Handbook of Chemistry and Physics (92nd ed.). CRC Press. p. 4.77. ISBN 978-1439855119.
^El Boragy M., Rajasekharan T.P., Schubert K. (1982). Z. Metallkd., 73, 193–197
^Wopersnow W., Schubert K. (1976) Z. Metallkd., 67, 807–810
^Beck, U.; Neumann, H.-G.; Becherer, G. (1973). "Phasenbildung in Ni/Si-Schichten". Kristall und Technik. 8 (10): 1125–1129. doi:10.1002/crat.19730081005.
Nickelsilicides include several intermetallic compounds of nickel and silicon. Nickelsilicides are important in microelectronics as they form at junctions...
layer of silicide at the metal–semiconductor interface. Nickelsilicide, NiSi Sodium silicide, NaSi Magnesium silicide, Mg2Si Platinum silicide, PtSi (platinum...
In contrast to the pyrophoric nature of some forms of Raney nickel, nickelsilicide-based catalysts represent potentially safer alternatives. Due to its...
Perryite is a nickelsilicide mineral. It is found in extremely silicon-rich meteorites. The type material is housed at the National Museum of Natural...
hydrogen. Nickelsilicides include Ni3Si, Ni31Si12, Ni2Si, Ni3Si2, NiSi and NiSi2. Nickelsilicides are used in microelectronics. Hot nickel vapour reacting...
Nickel monosilicide is an intermetallic compound formed out of nickel and silicon. Like other nickelsilicides, NiSi is of importance in the area of microelectronics...
implantation of nickel ions into a silicon wafer, a layer of nickelsilicide can be grown in which the crystal orientation of the silicide matches that of...
titanium nitride and liberating silicon; silicon then forms brittle nickelsilicides and eutectic gold-silicon phase; the resulting joint is weak and melts...
metal silicide contact through a series of annealing and/or etch processes. The term "salicide" is a compaction of the phrase self-aligned silicide. The...
metalloids, and nonmetals. The Nickel–Strunz classification system also includes the naturally occurring phosphides, silicides, nitrides, carbides, and arsenides...
Europe, Japan and the United States. The components were intended to replace nickel superalloy turbine blades or nozzle vanes. However, none of these projects...
Xifengite (Fe5Si3) is a rare metallic iron silicide mineral. The crystal system of xifengite is hexagonal. It has a specific gravity of 6.45 and a Mohs...
Nickel is one of the metals that can form Tutton's salts. The singly charged ion can be any of the full range of potassium, rubidium, cesium, ammonium...
hot spots in semiconductor devices, and thin-film alloy like cobalt-nickelsilicide. Signal obtained by the AFM (and captured by lock-in amplifier) are...
S. patent 1,790,552 in January 1931 for inoculating iron with calcium silicide to produce ductile iron subsequently licensed as Meehanite, still produced...
lanthanoids, and the intermetallics' overall enthalpies of formation resemble silicides, not germanides or plumbides. YSn3 is a electrical superconductor below...
ceramics can be also used, such as tantalum nitride, indium oxide, copper silicide, tungsten nitride, and titanium nitride. A barrier metal is a material...
used in very small quantities for grain refinement of titanium alloys. Silicides, inter-metallic involving silicon, are utilized as barrier and contact...
and more recently nickel is alloyed with the top layers of the polysilicon. Such a blended material is called silicide. The silicide-polysilicon combination...
containing silicon and one other chemical element. Technically the term silicide is reserved for any compounds containing silicon bonded to a more electropositive...
these include: C. Hayzelden, J. L. Batstone; Silicide formation and silicide‐mediated crystallization of nickel‐implanted amorphous silicon thin films. J...
brick-red compound that reacts with water to give methane. No beryllium silicide has been identified. The halides BeX2 (X = F, Cl, Br, and I) have a linear...
furnaces). Molybdenum disilicide (MoSi2) an inter-metallic compound, a silicide of molybdenum, is a refractory ceramic primarily used in heating elements...
compounds. CVD for molybdenum, tantalum, titanium, nickel is widely used. These metals can form useful silicides when deposited onto silicon. Mo, Ta and Ti are...
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