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Chemistry of photolithography information


A gold and aluminum sputtered solar cell manufactured from a <100> p-type silicon wafer at the Cal Poly San Luis Obispo Microfab clean room.

Photolithography is a process in removing select portions of thin films used in microfabrication. Microfabrication is the production of parts on the micro- and nano- scale, typically on the surface of silicon wafers, for the production of integrated circuits, microelectromechanical systems (MEMS), solar cells, and other devices. Photolithography makes this process possible through the combined use of hexamethyldisilazane (HMDS), photoresist (positive or negative), spin coating, photomask, an exposure system and other various chemicals. By carefully manipulating these factors it is possible to create nearly any geometry microstructure on the surface of a silicon wafer.[1] The chemical interaction between all the different components and the surface of the silicon wafer makes photolithography an interesting chemistry problem. Current engineering has been able to create features on the surface of silicon wafers between 1 and 100 μm.[2]

  1. ^ Fourkas, John T. (15 April 2010). "Nanoscale Photolithography with Visible Light". The Journal of Physical Chemistry Letters. 1 (8): 1221–1227. doi:10.1021/jz1002082.
  2. ^ Microelectromechanical systems

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Chemistry of photolithography

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the fabrication of large OLED/AMOLED displays. Experimental OLED displays using conventional photolithography techniques instead of FMMs have been demonstrated...

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J. Holmes, P.J Snell (1966). "A vapour etching technique for the photolithography of silicon dioxide". Microelectronics and Reliability. 5 (4): 337–341...

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observational results. The argon fluoride laser is important in photolithography of silicon chips. These lasers make a strong ultraviolet emission at...

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vitamin (vitamin B4). It is a structural part of phospholipids and a methyl donor in metabolic one-carbon chemistry. The compound is related to trimethylglycine...

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combination of strength, thermal stability, and UV transparency makes it an excellent substrate for projection masks for photolithography. Its UV transparency...

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