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Capacitively coupled plasma information


A capacitively coupled plasma (CCP) is one of the most common types of industrial plasma sources. It essentially consists of two metal electrodes separated by a small distance, placed in a reactor. The gas pressure in the reactor can be lower than atmosphere or it can be atmospheric.

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Capacitively coupled plasma

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A capacitively coupled plasma (CCP) is one of the most common types of industrial plasma sources. It essentially consists of two metal electrodes separated...

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Inductively coupled plasma

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contrast, in a capacitively coupled plasma (CCP), the electrodes are often placed inside the reactor chamber and are thus exposed to the plasma and to subsequent...

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Inductively coupled plasma atomic emission spectroscopy

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Inductively coupled plasma atomic emission spectroscopy (ICP-AES), also referred to as inductively coupled plasma optical emission spectroscopy (ICP-OES)...

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Inductively coupled plasma mass spectrometry

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Inductively coupled plasma mass spectrometry (ICP-MS) is a type of mass spectrometry that uses an inductively coupled plasma to ionize the sample. It atomizes...

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Plasma globe

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A plasma ball, plasma globe, or plasma lamp is a clear glass container filled with noble gases, usually a mixture of neon, krypton, and xenon, that has...

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Electrodeless plasma excitation

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important advantages over plasmas using electrodes, like capacitively coupled plasmas that are of great interest for contemporary plasma research and applications:...

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Induction plasma

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Induction plasma, also called inductively coupled plasma, is a type of high temperature plasma generated by electromagnetic induction, usually coupled with...

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Multipactor effect

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Getty, M.L. Brake, Y.Y. Lau, R.M. Gilgenbach, A. Valfells, Rev. Sci. Instrum., 72, 3095, July 2001 Capacitively coupled plasma Electron avalanche Fusor...

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Touchscreen

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pulses are applied to these conductors, one at a time. These pulses capacitively couple to every conductor that intersects it. Bringing a finger or conductive...

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Wireless power transfer

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three regimes – under-coupled, critically coupled and over-coupled. As the critical coupling coefficient increases from an under-coupled regime ( k < k c r...

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List of plasma physics articles

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This is a list of plasma physics topics. Contents:  Top 0–9 A B C D E F G H I J K L M N O P Q R S T U V W X Y Z Physics portal G.S. Miller, E.E. Salpeter...

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Transmon

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transmission line shunted plasma oscillation qubit; one which consists of a Cooper-pair box "where the two superconductors are also [capacitively] shunted in order...

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List of sensors

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device SSIES, Special Sensors-Ions, Electrons, and Scintillation thermal plasma analysis package SSMIS, Special Sensor Microwave Imager / Sounder Structured-light...

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Marx generator

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predicts that the voltage across all stages rises. However, stages are coupled capacitively to ground and serially to each other, and thus each stage encounters...

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Quantum dot

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by using nonthermal plasma. The size, shape, surface and composition of quantum dots can all be controlled in nonthermal plasma. Doping that seems quite...

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Resonant inductive coupling

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flux increases. Resonant systems are said to be tightly coupled, loosely coupled, critically coupled or overcoupled. Tight coupling is when the coupling coefficient...

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Tesla coil

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distance away from the driver, it is not magnetically coupled to it. RF energy is instead directly coupled from the output of the driver into the bottom of...

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Kwang Hwa Chung

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(December 2004). "Ion Species and Electron Behavior in Capacitively Coupled Ar and O2 Plasma". Journal of Applied Physics. 96 (11). College Park, Maryland:...

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Nikola Tesla

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X-rays were longitudinal waves, such as those produced in waves in plasmas. These plasma waves can occur in force-free magnetic fields. On 11 July 1934,...

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Microelectromechanical system oscillator

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Kaajakari, V.; Koskinen, J.K.; Mattila, T. (2005). "Phase noise in capacitively coupled micromechanical oscillators". IEEE Transactions on Ultrasonics, Ferroelectrics...

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Printed circuit board

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through, this smear must be removed by a chemical de-smear process, or by Plasma etching. The de-smear process ensures that a good connection is made to...

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