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Dawon Kahng information


Dawon Kahng
강대원
Born(1931-05-04)May 4, 1931[1]
Keijō, Keiki-dō, Korea
(today Seoul, South Korea)
DiedMay 13, 1992(1992-05-13) (aged 61)[2]
New Brunswick, New Jersey, U.S.
CitizenshipSouth Korean (renounced)
United States
OccupationElectrical engineer
Known forMOSFET (MOS transistor)
PMOS and NMOS
Schottky diode
Nanolayer-base transistor
Floating-gate MOSFET
Floating-gate memory
Reprogrammable ROM
Korean name
Hangul
강대원
Hanja
姜大元
Revised RomanizationGang Dae-won
McCune–ReischauerKang Daewŏn

Dawon Kahng (Korean: 강대원; May 4, 1931 – May 13, 1992) was a Korean-American electrical engineer and inventor, known for his work in solid-state electronics. He is best known for inventing the MOSFET (metal–oxide–semiconductor field-effect transistor, or MOS transistor), along with his colleague Mohamed Atalla, in 1959. Kahng and Atalla developed both the PMOS and NMOS processes for MOSFET semiconductor device fabrication. The MOSFET is the most widely used type of transistor, and the basic element in most modern electronic equipment.

Kahng and Atalla later proposed the concept of the MOS integrated circuit, and they did pioneering work on Schottky diodes and nanolayer-base transistors in the early 1960s. Kahng then invented the floating-gate MOSFET (FGMOS) with Simon Min Sze in 1967. Kahng and Sze proposed that FGMOS could be used as floating-gate memory cells for non-volatile memory (NVM) and reprogrammable read-only memory (ROM), which became the basis for EPROM (erasable programmable ROM), EEPROM (electrically erasable programmable ROM) and flash memory technologies. Kahng was inducted into the National Inventors Hall of Fame in 2009.

  1. ^ "Dawon Kahng". National Inventors Hall of Fame. 2009. Archived from the original on 28 March 2009. Retrieved 28 March 2009.
  2. ^ Daniels, Lee A. (28 May 1992). "New York Times obituary". The New York Times. Archived from the original on 2020-07-26. Retrieved 2017-02-15.

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